Modeling of metastable phase formation for sputtered Ti1-xAlxN thin films | |
Liu, Sida; Chang, Keke; Mraz, Stanislav; Chen, Xiang; Hans, Marcus; Music, Denis; Primetzhofer, Daniel; Schneider, Jochen M. | |
刊名 | ACTA MATERIALIA |
2019 | |
卷号 | 165页码:615-625 |
关键词 | INITIO MOLECULAR-DYNAMICS AB-INITIO DEPENDENT STABILITY TRANSITION TIN COATINGS MICROSTRUCTURE NITRIDE SYSTEM GROWTH |
DOI | 10.1016/j.actamat.2018.12.004 |
英文摘要 | Modeling of metastable phase formation for sputtered Ti1-xAlxN thin films |
内容类型 | 期刊论文 |
源URL | [http://ir.nimte.ac.cn/handle/174433/18552] |
专题 | 2019专题 |
作者单位 | Chang, KK (reprint author), Rhein Westfal TH Aachen, Mat Chem, Kopernikusstr 10, D-52074 Aachen, Germany. |
推荐引用方式 GB/T 7714 | Liu, Sida,Chang, Keke,Mraz, Stanislav,et al. Modeling of metastable phase formation for sputtered Ti1-xAlxN thin films[J]. ACTA MATERIALIA,2019,165:615-625. |
APA | Liu, Sida.,Chang, Keke.,Mraz, Stanislav.,Chen, Xiang.,Hans, Marcus.,...&Schneider, Jochen M..(2019).Modeling of metastable phase formation for sputtered Ti1-xAlxN thin films.ACTA MATERIALIA,165,615-625. |
MLA | Liu, Sida,et al."Modeling of metastable phase formation for sputtered Ti1-xAlxN thin films".ACTA MATERIALIA 165(2019):615-625. |
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