Calibration of photoelectromagnetic sensor in a laser source
LIU, RONG; RAFAC, ROBERT J.; MYERS, DAVID WAYNE; BERGSTEDT, ROBERT A.; MCKENZIE, PAUL ALEXANDER
2016-01-19
著作权人ASML NETHERLANDS B.V.
专利号US9239269
国家美国
文献子类授权发明
其他题名Calibration of photoelectromagnetic sensor in a laser source
英文摘要In a laser-produced plasma (LPP) extreme ultraviolet (EUV) system, laser pulses are used to produce EUV light. To determine the energy of individual laser pulses, a photoelectromagnetic (PEM) detector is calibrated to a power meter using a calibration coefficient. When measuring a unitary laser beam comprising pulses of a single wavelength, the calibration coefficient is calculated based on a burst of the pulses. A combined laser beam has main pulses of a first wavelength alternating with pre-pulses pulses of a second wavelength. To calculate the energy of the main pulses in the combined laser beam, the calibration coefficient calculated for a unitary laser beam of the main pulses is used. To calculate the energy of the pre-pulses in the combined laser beam, a new calibration coefficient is calculated. When the calculated energy values drift beyond a pre-defined threshold, the calibration coefficients are recalculated.
公开日期2016-01-19
申请日期2014-07-14
状态授权
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/67948]  
专题半导体激光器专利数据库
作者单位ASML NETHERLANDS B.V.
推荐引用方式
GB/T 7714
LIU, RONG,RAFAC, ROBERT J.,MYERS, DAVID WAYNE,et al. Calibration of photoelectromagnetic sensor in a laser source. US9239269. 2016-01-19.
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