Calibration of photoelectromagnetic sensor in a laser source | |
LIU, RONG; RAFAC, ROBERT J.; MYERS, DAVID WAYNE; BERGSTEDT, ROBERT A.; MCKENZIE, PAUL ALEXANDER | |
2016-01-19 | |
著作权人 | ASML NETHERLANDS B.V. |
专利号 | US9239269 |
国家 | 美国 |
文献子类 | 授权发明 |
其他题名 | Calibration of photoelectromagnetic sensor in a laser source |
英文摘要 | In a laser-produced plasma (LPP) extreme ultraviolet (EUV) system, laser pulses are used to produce EUV light. To determine the energy of individual laser pulses, a photoelectromagnetic (PEM) detector is calibrated to a power meter using a calibration coefficient. When measuring a unitary laser beam comprising pulses of a single wavelength, the calibration coefficient is calculated based on a burst of the pulses. A combined laser beam has main pulses of a first wavelength alternating with pre-pulses pulses of a second wavelength. To calculate the energy of the main pulses in the combined laser beam, the calibration coefficient calculated for a unitary laser beam of the main pulses is used. To calculate the energy of the pre-pulses in the combined laser beam, a new calibration coefficient is calculated. When the calculated energy values drift beyond a pre-defined threshold, the calibration coefficients are recalculated. |
公开日期 | 2016-01-19 |
申请日期 | 2014-07-14 |
状态 | 授权 |
内容类型 | 专利 |
源URL | [http://ir.opt.ac.cn/handle/181661/67948] |
专题 | 半导体激光器专利数据库 |
作者单位 | ASML NETHERLANDS B.V. |
推荐引用方式 GB/T 7714 | LIU, RONG,RAFAC, ROBERT J.,MYERS, DAVID WAYNE,et al. Calibration of photoelectromagnetic sensor in a laser source. US9239269. 2016-01-19. |
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