Method of forming electrode of semiconductor laser
SUZAKI SHINZO
1989-06-29
著作权人FUJIKURA LTD
专利号JP1989165192A
国家日本
文献子类发明申请
其他题名Method of forming electrode of semiconductor laser
英文摘要PURPOSE:To increase the strength against wire bonding and decrease the fraction of defective, by forming a metal layer sticking well to an insulation film on an ohmic electrode and said insulation film, a gold layer on said metal layer, and a gold plated layer on said gold layer. CONSTITUTION:An insulation film 7 (SiO2) having a window 9 made just on a clad layer 4 is formed on a chip comprising a board 2 on which an active layer 3, the clad layer 4, and first and second buried layers 5 and 6 are formed. Forming a first electrode 1 (Au/Sn) and a second electrode 8 (Au/Zn) on the upper and lower surfaces of the chip and then eliminating the electrode 8 on the insulation film 7 form the electrode 8 only on the window portion 9. A Cr layer 11 and an Au layer 12 are formed on the upper surface of the chip in this order, photoresist 13 is applied to close the window 9, etched, and eliminated, and then an Au plating layer 14 is formed on the Au layer 12 to produce a wire bonding pad. This increases the adhesion of the SiO2 film 7, the Cr layer 11, and Au layer 12 and the strength against wire bonding.
公开日期1989-06-29
申请日期1987-12-22
状态失效
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/67617]  
专题半导体激光器专利数据库
作者单位FUJIKURA LTD
推荐引用方式
GB/T 7714
SUZAKI SHINZO. Method of forming electrode of semiconductor laser. JP1989165192A. 1989-06-29.
个性服务
查看访问统计
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。


©版权所有 ©2017 CSpace - Powered by CSpace