Manufacture of visible ray semiconductor laser device | |
KAGEYAMA SHIGEMI; ARIMOTO SATOSHI; KONNO NOBUAKI | |
1990-08-03 | |
著作权人 | MITSUBISHI ELECTRIC CORP |
专利号 | JP1990196487A |
国家 | 日本 |
文献子类 | 发明申请 |
其他题名 | Manufacture of visible ray semiconductor laser device |
英文摘要 | PURPOSE:To obtain a gradient index visible semiconductor laser device having an IS(Inner Stripe) structure which has a low threshold and is easy to operate a fundamental mode by burying a 3mum or less intrastructure striped groove with a lower cladding layer AlGaInP until the surface of the groove is flattened, and such that a film thickness is 0.5mum or less. CONSTITUTION:A p type AlGaInP lower cladding layer 6 is made satisfactorily thin and is crystal-grown so as to provide a flattened surface. This is assured by the stripe width of a U-shaped groove and growing conditions. For example, if it is assumed that the U-shaped groove stripe width is 2mum, and that pressure, temperature, and a ratio of elements of groups V and III at growth are 76Torr, 680 deg.C, and 200, respectively, the thickness of the undercladding layer is about 0.4mum. The under cladding layer 6 is satisfactorily thin at the flattened portion, so that light emanating from an active layer 7 excepting the V-shaped groove stripe portion 11 is absorbed by a GaInP current blocking layer 5. Thus, the light is confined in the active layer located above the V-shaped groove stripe, which enables an oscillation in a fundamental mode. |
公开日期 | 1990-08-03 |
申请日期 | 1989-01-25 |
状态 | 失效 |
内容类型 | 专利 |
源URL | [http://ir.opt.ac.cn/handle/181661/64080] ![]() |
专题 | 半导体激光器专利数据库 |
作者单位 | MITSUBISHI ELECTRIC CORP |
推荐引用方式 GB/T 7714 | KAGEYAMA SHIGEMI,ARIMOTO SATOSHI,KONNO NOBUAKI. Manufacture of visible ray semiconductor laser device. JP1990196487A. 1990-08-03. |
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