Adjustable laser illumination pattern
NEMEYER, ADAM
2016-07-21
著作权人STEINER EOPTICS, INC.
专利号US20160208988A1
国家美国
文献子类发明申请
其他题名Adjustable laser illumination pattern
英文摘要A laser illuminator emitting a circular profile of substantially uniform intensity is presented. The laser illuminator may include a heat sink configured to optically couple to a laser light source. The heat sink may include a beam dump cavity configured to absorb light from the laser light source, and a circularizer aperture having a cylindrical, flat-top opening and being configured to shape a portion of laser light emitted from the laser light source to exit the heat sink. The laser illuminator may also include a collimation lens configured to collect the light exited from the heat sink and provide a focused beam of light, and a scatter clean-up aperture optically coupled to the collimation lens. The scatter clean-up aperture may be configured to absorb scatter laser light rays, and provide from the focused beam of light an output beam of light comprising a circular profile of substantially uniform intensity.
公开日期2016-07-21
申请日期2015-01-16
状态授权
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/54557]  
专题半导体激光器专利数据库
作者单位STEINER EOPTICS, INC.
推荐引用方式
GB/T 7714
NEMEYER, ADAM. Adjustable laser illumination pattern. US20160208988A1. 2016-07-21.
个性服务
查看访问统计
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。


©版权所有 ©2017 CSpace - Powered by CSpace