Heat sink for a semiconductor device
YOO, MYOUNG KI; BAIK, YOUNG-JOON; HONG, KYUNG TAE
2001-06-14
著作权人KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
专利号US20010003377A1
国家美国
文献子类发明申请
其他题名Heat sink for a semiconductor device
英文摘要A heat sink for a semiconductor device comprises a tungsten-copper composite body and a diamond film coated on the surface of the body. A method for fabricating a heat sink for a semiconductor comprises the steps of fabricating a tungsten-copper composite heat sink, modifying a surface of the heat sink by selectively dissolving copper from the surface of the heat sink, carrying out a process for supplying nuclei for growth of a diamond film on the modified surface of the heat sink, and coating the thusly processed surface of the heat sink with a diamond film. Preferably, a process for etching of a tungsten grain precedes selective dissolution of the copper.
公开日期2001-06-14
申请日期1999-07-19
状态失效
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/52217]  
专题半导体激光器专利数据库
作者单位KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
推荐引用方式
GB/T 7714
YOO, MYOUNG KI,BAIK, YOUNG-JOON,HONG, KYUNG TAE. Heat sink for a semiconductor device. US20010003377A1. 2001-06-14.
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