Ion-implanted planar-buried-heterostructure diode laser
BRENNAN, THOMAS M.; HAMMONS, BURRELL E.; MYERS, DAVID R.; VAWTER, GREGORY A.
1991-09-10
著作权人THE UNITED STATES OF AMERICA AS REPRESENTED BY THE UNITED STATES
专利号US5048038
国家美国
文献子类授权发明
其他题名Ion-implanted planar-buried-heterostructure diode laser
英文摘要A Planar-Buried-Heterostructure, Graded-Index, Separate-Confinement-Heterostructure semiconductor diode laser 10 includes a single quantum well or multi-quantum well active stripe 12 disposed between a p-type compositionally graded Group III-V cladding layer 14 and an n-type compositionally graded Group III-V cladding layer 16. The laser 10 includes an ion implanted n-type region 28 within the p-type cladding layer 14 and further includes an ion implanted p-type region 26 within the n-type cladding layer 16. The ion implanted regions are disposed for defining a lateral extent of the active stripe.
公开日期1991-09-10
申请日期1990-01-25
状态失效
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/46184]  
专题半导体激光器专利数据库
作者单位THE UNITED STATES OF AMERICA AS REPRESENTED BY THE UNITED STATES
推荐引用方式
GB/T 7714
BRENNAN, THOMAS M.,HAMMONS, BURRELL E.,MYERS, DAVID R.,et al. Ion-implanted planar-buried-heterostructure diode laser. US5048038. 1991-09-10.
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