| Surface topography of vinyltriethoxysilane films deposited on the silicon dioxide substrate (0001) investigated by Atomic Force Microscopy | |
| Wu, Yun; Cai, Chujiang; Shen, Zhigang; Ma, Shulin; Xing, Yushan | |
| 2012 | |
| 会议名称 | 2nd International Conference on Advances in Materials and Manufacturing Processes (ICAMMP 2011) |
| 会议日期 | 2012-01-01 |
| 会议地点 | Guillin, PEOPLES R CHINA |
| 关键词 | vinyltriethoxysilane surface topography self-assembled monolayer atomic force microscopy (AFM) |
| 卷号 | 418-420 |
| 页码 | 513-522 |
| 收录类别 | EI ; CPCI-S |
| URL标识 | 查看原文 |
| WOS记录号 | WOS:000302668300107 |
| 内容类型 | 会议论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/6575476 |
| 专题 | 北京航空航天大学 |
| 推荐引用方式 GB/T 7714 | Wu, Yun,Cai, Chujiang,Shen, Zhigang,et al. Surface topography of vinyltriethoxysilane films deposited on the silicon dioxide substrate (0001) investigated by Atomic Force Microscopy[C]. 见:2nd International Conference on Advances in Materials and Manufacturing Processes (ICAMMP 2011). Guillin, PEOPLES R CHINA. 2012-01-01. |
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