Stability improvement of selective oxidation during the fabrication of InGaAs/GaAs vertical cavity surface emitting laser
Pan Z ; Zhang Y ; Du Y ; Wu RH
刊名japanese journal of applied physics part 1-regular papers short notes & review papers
1998
卷号37期号:6b页码:3673-3675
关键词VCSEL selective oxidation stability MICROSTRUCTURE WET OXIDATION
ISSN号0021-4922
通讯作者pan z,tokyo inst technol,precis & intelligence lab,midori ku,4259 nagatsuta,yokohama,kanagawa 2268503,japan.
中文摘要the effects of the carrier gas flow and water temperature on the oxidation rate for different reaction temperatures were investigated. the optimum conditions for stable oxidation were obtained. two mechanisms of the oxidation process are revealed. one is the flow-controlling process, which is unstable. the other is the temperature-controlling process, which is stable. the stable region decreases for higher reaction temperatures. the simulation results for the stable oxidation region are also given. with optimum oxidation conditions, the stability and precision of the oxidation can be dramatically improved.
学科主题半导体物理
收录类别SCI
语种英语
公开日期2010-08-12
内容类型期刊论文
源URL[http://ir.semi.ac.cn/handle/172111/13162]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Pan Z,Zhang Y,Du Y,et al. Stability improvement of selective oxidation during the fabrication of InGaAs/GaAs vertical cavity surface emitting laser[J]. japanese journal of applied physics part 1-regular papers short notes & review papers,1998,37(6b):3673-3675.
APA Pan Z,Zhang Y,Du Y,&Wu RH.(1998).Stability improvement of selective oxidation during the fabrication of InGaAs/GaAs vertical cavity surface emitting laser.japanese journal of applied physics part 1-regular papers short notes & review papers,37(6b),3673-3675.
MLA Pan Z,et al."Stability improvement of selective oxidation during the fabrication of InGaAs/GaAs vertical cavity surface emitting laser".japanese journal of applied physics part 1-regular papers short notes & review papers 37.6b(1998):3673-3675.
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