Effect of buffer layer growth conditions on the secondary hexagonal phase content in cubic GaN films on GaAs(001) substrates
Zhao DG
刊名journal of crystal growth
2000
卷号212期号:3-4页码:397-401
关键词III-V semiconductor MOCVD RHEED XRDCD SAPPHIRE
ISSN号0022-0248
通讯作者sun xl,chinese acad sci,inst semicond,natl res ctr optoelect technol,beijing 100083,peoples r china.
中文摘要in this letter, we investigated the effect of the buffer layer growth conditions on the secondary hexagonal phase content in cubic gan films on gaas(0 0 1) substrate. the reflection high-energy electron diffraction (rheed) pattern of the low-temperature gan buffer layers shows that both the deposition temperature and time are important in obtaining a smooth surface. four-circle x-ray double-crystal diffraction (xrdcd) reciprocal space mapping was used to study the hexagonal phase inclusions in the cubic gan (c-gan) films grown on the buffer layers. the calculation of the volume contents of the hexagonal phase shows that higher temperature and longer time deposition of the buffer layer is not preferable for growing pure c-gan film. under optimized condition, 47 mev fwhm of near band gap emission of the c-gan film was achieved. (c) 2000 elsevier science b.v. all rights reserved.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-08-12
内容类型期刊论文
源URL[http://ir.semi.ac.cn/handle/172111/12622]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
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Zhao DG. Effect of buffer layer growth conditions on the secondary hexagonal phase content in cubic GaN films on GaAs(001) substrates[J]. journal of crystal growth,2000,212(3-4):397-401.
APA Zhao DG.(2000).Effect of buffer layer growth conditions on the secondary hexagonal phase content in cubic GaN films on GaAs(001) substrates.journal of crystal growth,212(3-4),397-401.
MLA Zhao DG."Effect of buffer layer growth conditions on the secondary hexagonal phase content in cubic GaN films on GaAs(001) substrates".journal of crystal growth 212.3-4(2000):397-401.
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