Influence of strain on annealing effects of In(Ga)As quantum dots
Xu B
刊名journal of crystal growth
2002
卷号244期号:2页码:136-141
关键词low dimensional structures strain molecular beam epitaxy quantum dots ELECTRONIC-STRUCTURE PHOTOLUMINESCENCE INTERDIFFUSION TRANSITIONS SPECTRA
ISSN号0022-0248
通讯作者zhang yc,nanyang technol univ,sch elect & elect engn,photon lab 1,nanyang ave,singapore 639798,singapore.
中文摘要post-growth rapid thermal annealing has been performed with in(ga)as quantum dots (qds) at different strain statuses. it is confirmed that the strain-enhanced interdiffusion decreases the inhomogeneous size distribution. the preferential lateral interdiffusion of qds during annealing was observed. we attribute it to the naturally anisotropic strain distribution in/around the dots and the saturation of strain difference between the base boundary and the top of the dots. there exist strain-enhanced mechanism and vacancy diffusion enhanced mechanism during the annealing. as to which one dominates the qd interdiffusion depends on the thickness of capping layer and the annealing temperature. (c) 2002 elsevier science b.v. all rights reserved.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-08-12
内容类型期刊论文
源URL[http://ir.semi.ac.cn/handle/172111/11786]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
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Xu B. Influence of strain on annealing effects of In(Ga)As quantum dots[J]. journal of crystal growth,2002,244(2):136-141.
APA Xu B.(2002).Influence of strain on annealing effects of In(Ga)As quantum dots.journal of crystal growth,244(2),136-141.
MLA Xu B."Influence of strain on annealing effects of In(Ga)As quantum dots".journal of crystal growth 244.2(2002):136-141.
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