Abnormal effect of growth interruption on GaSb quantum dots formation grown by molecular beam epitaxy
Luo XD ; Xu ZY ; Wang YQ ; Wang WX ; Wang JN ; Ge WK
刊名journal of crystal growth
2003
卷号247期号:1-2页码:99-104
关键词growth interruption molecular beam epitaxy quantum dots GaSb WELLS
ISSN号0022-0248
通讯作者luo xd,chinese acad sci,inst semicond,nlsm,beijing 100083,peoples r china.
中文摘要the growth interruption (gi) effect on gasb quantum dot formation grown on gaas by molecular beam epitaxy was investigated. the structure characterization was performed by reflection high-energy electron diffraction (rheed), along with photoluminescence measurements. it is found that the gi can significantly change the surface morphology of gasb qds. during the gi, the qds structures can be smoothed out and turned into a 2d-like structure. the time duration of the gi required for the 3d/2d transition depends on the growth time of the gasb layer. it increases with the increase of the growth time. our results are explained by a combined effect of the stress relaxation process and surface exchange reactions during the gi. (c) 2002 elsevier science b.v. all rights reserved.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-08-12
内容类型期刊论文
源URL[http://ir.semi.ac.cn/handle/172111/11688]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
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GB/T 7714
Luo XD,Xu ZY,Wang YQ,et al. Abnormal effect of growth interruption on GaSb quantum dots formation grown by molecular beam epitaxy[J]. journal of crystal growth,2003,247(1-2):99-104.
APA Luo XD,Xu ZY,Wang YQ,Wang WX,Wang JN,&Ge WK.(2003).Abnormal effect of growth interruption on GaSb quantum dots formation grown by molecular beam epitaxy.journal of crystal growth,247(1-2),99-104.
MLA Luo XD,et al."Abnormal effect of growth interruption on GaSb quantum dots formation grown by molecular beam epitaxy".journal of crystal growth 247.1-2(2003):99-104.
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