Investigation of oxygen vacancy and interstitial oxygen defects in ZnO films by photoluminescence and x-ray photoelectron spectroscopy
Fan HB (Fan Hai-Bo) ; Yang SY (Yang Shao-Yan) ; Zhang PF (Zhang Pan-Feng) ; Wei HY (Wei Hong-Yuan) ; Liu XL (Liu Xiang-Lin) ; Jiao CM (Jiao Chun-Mei) ; Zhu QS (Zhu Qin-Sheng) ; Chen YH (Chen Yong-Hai) ; Wang ZG (Wang Zhan-Guo)
刊名chinese physics letters
2007
卷号24期号:7页码:2108-2111
关键词THIN-FILMS
ISSN号issn: 0256-307x
通讯作者fan, hb, chinese acad sci, key lab semicond mat sci, inst semicond, pob 912, beijing 100083, peoples r china. 电子邮箱地址: hbfan@semi.ac.cn ; sh-yyang@semi.ac.cn
中文摘要zno films prepared at different temperatures and annealed at 900 degrees c in oxygen are studied by photoluminescence (pl) and x-ray photoelection spectroscopy (xps). it is observed that in the pl of the as-grown films the green luminescence (gl) and the yellow luminescence (yl) are related, and after annealing the gl is restrained and the yl is enhanced. the o 1s xps results also show the coexistence of oxygen vacancy (vo) and interstitial oxygen (o-i) before annealing and the quenching of the v-o after annealing. by combining the two results it is deduced that the gl and yl are related to the v-o and o-i defects, respectively.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-03-29
内容类型期刊论文
源URL[http://ir.semi.ac.cn/handle/172111/9416]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Fan HB ,Yang SY ,Zhang PF ,et al. Investigation of oxygen vacancy and interstitial oxygen defects in ZnO films by photoluminescence and x-ray photoelectron spectroscopy[J]. chinese physics letters,2007,24(7):2108-2111.
APA Fan HB .,Yang SY .,Zhang PF .,Wei HY .,Liu XL .,...&Wang ZG .(2007).Investigation of oxygen vacancy and interstitial oxygen defects in ZnO films by photoluminescence and x-ray photoelectron spectroscopy.chinese physics letters,24(7),2108-2111.
MLA Fan HB ,et al."Investigation of oxygen vacancy and interstitial oxygen defects in ZnO films by photoluminescence and x-ray photoelectron spectroscopy".chinese physics letters 24.7(2007):2108-2111.
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