Surface plasmon enhanced ultraviolet emission from ZnO films deposited on Ag/Si(001) by magnetron sputtering | |
Zhang XW; You JB; Fan YM | |
刊名 | applied physics letters |
2007 | |
卷号 | 91期号:23页码:art. no. 231907 |
关键词 | MOLECULAR-BEAM EPITAXY |
ISSN号 | 0003-6951 |
通讯作者 | zhang, xw, chinese acad sci, inst semicond, key lab semicond mat sci, beijing 100083, peoples r china. 电子邮箱地址: xwzhang@semi.ac.cn |
中文摘要 | the zno films were grown on ag/si(001) substrates by sputtering ag and zno targets successively in a pure ar ambient. a significant enhancement of zno ultraviolet emission and a reduction of its full width of half maximum have been observed while introducing a 100 nm ag interlayer between zno film and si substrate. furthermore, a complete suppression of the defect related visible emission was also found for the zno/ag/si sample. this improved optical performance of zno is attributed to the resonant coupling between ag surface plasmon and ultraviolet emission of zno. (c) 2007 american institute of physics. |
学科主题 | 半导体材料 |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2010-03-08 |
内容类型 | 期刊论文 |
源URL | [http://ir.semi.ac.cn/handle/172111/6960] |
专题 | 半导体研究所_中国科学院半导体研究所(2009年前) |
推荐引用方式 GB/T 7714 | Zhang XW,You JB,Fan YM. Surface plasmon enhanced ultraviolet emission from ZnO films deposited on Ag/Si(001) by magnetron sputtering[J]. applied physics letters,2007,91(23):art. no. 231907. |
APA | Zhang XW,You JB,&Fan YM.(2007).Surface plasmon enhanced ultraviolet emission from ZnO films deposited on Ag/Si(001) by magnetron sputtering.applied physics letters,91(23),art. no. 231907. |
MLA | Zhang XW,et al."Surface plasmon enhanced ultraviolet emission from ZnO films deposited on Ag/Si(001) by magnetron sputtering".applied physics letters 91.23(2007):art. no. 231907. |
个性服务 |
查看访问统计 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论