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	Optical system of large relative aperture and wide field using aspheric corrector for detecting (EI CONFERENCE)
	Ming M. ; Wang J. ; Zhang J.
	2009
会议名称	4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, November 19, 2008 - November 21, 2008
会议地点	Chengdu, China
关键词	The magnitude requirement of space target detecting determines that the image of detecting telescope should have several performances: small spots the wider field of view small 80% encircled energy diameter and good MTF(Modulation transfer function). So the aperture and field of view of optical system have some demands accordingly. The larger aperture the more extensive range which the telescope searches. Now most of ground telescopes whose apertures are from 500mm to 1000mm is on-axis optical system the more energy that telescope collects and higher magnitude the telescope detects so wide field of view becomes the most importance problem. To obtain large relative aperture and wide field of view the paper introduces a catadioptric telescope with small aperture aspheric refractive corrector whose conic surface will be used to remove the aberrations due to large relative aperture and wide field of view. As to the optical system there is only one aspheric refractive corrector and it is relatively easy for manufacturing because of its concave figure and normal material. The paper gives the example and optimizes this optical system with ZEMAX program. And then the paper provides a specific analysis program for testing the aspheric refractive corrector. The aperture of this optical system is 750mm and its relative aperture is 0.82 and the field of view is 3.6 diameter(diagonal). Its structure is simple and the image quality is also very good. 2009 SPIE.
收录类别	EI
内容类型	会议论文
源URL	[http://ir.ciomp.ac.cn/handle/181722/33851]
专题	长春光学精密机械与物理研究所_中科院长春光机所知识产出_会议论文
推荐引用方式 GB/T 7714	Ming M.,Wang J.,Zhang J.. Optical system of large relative aperture and wide field using aspheric corrector for detecting (EI CONFERENCE)[C]. 见:4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, November 19, 2008 - November 21, 2008. Chengdu, China.

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