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Direct patterning of highly-conductive graphene@copper composites using copper naphthenate as a resist for graphene device applications.
Bi, Kaixi; Xiang, Quan; Chen, Yiqin; Shi, Huimin; Li, Zhiqin; Lin, Jun; Zhang, Yongzhe; Wan, Qiang; Zhang, Guanhua; Qin, Shiqiao
刊名Nanoscale
2017
ISSN号2040-3364
URL标识查看原文
公开日期[db:dc_date_available]
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/6046254
专题湖南大学
作者单位1.School of Physics and Electronics, State Key Laboratory of Advanced Design and Manufacturing for Vehicle Body, Hunan University, Changsha
2.410082, China
3.College of Materials Science and Engineering, Beijing University of Technology, Beijing
4.10012
推荐引用方式
GB/T 7714
Bi, Kaixi,Xiang, Quan,Chen, Yiqin,et al. Direct patterning of highly-conductive graphene@copper composites using copper naphthenate as a resist for graphene device applications.[J]. Nanoscale,2017.
APA Bi, Kaixi.,Xiang, Quan.,Chen, Yiqin.,Shi, Huimin.,Li, Zhiqin.,...&Duan, Huigao.(2017).Direct patterning of highly-conductive graphene@copper composites using copper naphthenate as a resist for graphene device applications..Nanoscale.
MLA Bi, Kaixi,et al."Direct patterning of highly-conductive graphene@copper composites using copper naphthenate as a resist for graphene device applications.".Nanoscale (2017).
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