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Phase-Field Simulation for the Effects of Initial Vacancy Concentration and Annealing Temperature on Oxygen Clusters in Silicon Wafer
Xiao-Jun GUAN; Xiang JI
2016
关键词phase field simulation silicon wafer low temperature annealing initial vacancy concentration annealing temperature oxygen clusters
会议录Proceedings of 2016 4th International Conference on Machinery,Materials and Computing Technology(ICMMCT 2016)
URL标识查看原文
内容类型会议论文
URI标识http://www.corc.org.cn/handle/1471x/6032488
专题山东大学
作者单位1.School of Materials Science and Engineering, Shandong University
2.State Key laboratory of Crystal Material, Shandong Universit
推荐引用方式
GB/T 7714
Xiao-Jun GUAN,Xiang JI. Phase-Field Simulation for the Effects of Initial Vacancy Concentration and Annealing Temperature on Oxygen Clusters in Silicon Wafer[C]. 见:.
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