A study on W vacancy defect in mono-layer transition-metal dichalcogenide (TMD) TFETs through systematic ab initio calculations | |
Wu, Jixuan; Fan, Zhiqiang; Chen, Jiezhi; Jiang, Xiangwei | |
2017 | |
会议名称 | 22nd Silicon Nanoelectronics Workshop, SNW 2017 |
会议日期 | 4 June 2017 through 5 June 2017 |
卷号 | 2017-January |
DOI | 10.23919/SNW.2017.8242271 |
页码 | 9-10 |
收录类别 | EI ; SCOPUS |
会议录 | 2017 Silicon Nanoelectronics Workshop, SNW 2017 |
URL标识 | 查看原文 |
内容类型 | 会议论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/6029492 |
专题 | 山东大学 |
作者单位 | 1.School ofinformation Science and Engineering, Shandong University, Jinan, China 2.[Wu, Jixuan 3.Fan, Zhiqiang 4.Jiang, Xiangwe |
推荐引用方式 GB/T 7714 | Wu, Jixuan,Fan, Zhiqiang,Chen, Jiezhi,et al. A study on W vacancy defect in mono-layer transition-metal dichalcogenide (TMD) TFETs through systematic ab initio calculations[C]. 见:22nd Silicon Nanoelectronics Workshop, SNW 2017. 4 June 2017 through 5 June 2017. |
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