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A study on W vacancy defect in mono-layer transition-metal dichalcogenide (TMD) TFETs through systematic ab initio calculations
Wu, Jixuan; Fan, Zhiqiang; Chen, Jiezhi; Jiang, Xiangwei
2017
会议名称22nd Silicon Nanoelectronics Workshop, SNW 2017
会议日期4 June 2017 through 5 June 2017
卷号2017-January
DOI10.23919/SNW.2017.8242271
页码9-10
收录类别EI ; SCOPUS
会议录2017 Silicon Nanoelectronics Workshop, SNW 2017
URL标识查看原文
内容类型会议论文
URI标识http://www.corc.org.cn/handle/1471x/6029492
专题山东大学
作者单位1.School ofinformation Science and Engineering, Shandong University, Jinan, China
2.[Wu, Jixuan
3.Fan, Zhiqiang
4.Jiang, Xiangwe
推荐引用方式
GB/T 7714
Wu, Jixuan,Fan, Zhiqiang,Chen, Jiezhi,et al. A study on W vacancy defect in mono-layer transition-metal dichalcogenide (TMD) TFETs through systematic ab initio calculations[C]. 见:22nd Silicon Nanoelectronics Workshop, SNW 2017. 4 June 2017 through 5 June 2017.
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