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	Plasma induced by pulsed laser and fabrication of silicon nanostructures
	Huang WQ(黄伟其); Dong TG(董泰阁); Wang G(王刚); Liu SR(刘世荣); Huang ZM(黄忠梅); Miao XJ(苗信建); Lv Q(吕泉); Qin CJ(秦朝建)
	2015
卷号	0期号:8页码:340-345
关键词	nanosilicon pulsed laser plasmon photon
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/5969488
专题	贵州大学
作者单位	1.[1]Institute of Nanophotonic Physics, Key Laboratory of Photoelectron Technology and Application,Guizhou University 2.[2]State Key Laboratory of Ore Deposit Geochemistry, Institute of Geochemistry, Chinese Academy of Sciences 3.[3]Surface Physics Laboratory, Department of Physics, Fudan University
推荐引用方式 GB/T 7714	Huang WQ,Dong TG,Wang G,et al. Plasma induced by pulsed laser and fabrication of silicon nanostructures[J],2015,0(8):340-345.
APA	Huang WQ.,Dong TG.,Wang G.,Liu SR.,Huang ZM.,...&Qin CJ.(2015).Plasma induced by pulsed laser and fabrication of silicon nanostructures.,0(8),340-345.
MLA	Huang WQ,et al."Plasma induced by pulsed laser and fabrication of silicon nanostructures".0.8(2015):340-345.

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