| Fermi-level pinning in full metal/high-k/SiO2/Si stacks | |
| Huang, Anping; Zhang, Xinjiang; Li, Yue; Wang, Mei; Xiao, Zhisong | |
| 刊名 | JOURNAL OF APPLIED PHYSICS
 |
| 2017 | |
| 卷号 | 122 |
| ISSN号 | 0021-8979 |
| DOI | 10.1063/1.5005570 |
| URL标识 | 查看原文 |
| 收录类别 | SCIE ; EI |
| WOS记录号 | WOS:000415703300020 |
| 内容类型 | 期刊论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/5936391 |
| 专题 | 北京航空航天大学 |
| 推荐引用方式 GB/T 7714 | Huang, Anping,Zhang, Xinjiang,Li, Yue,et al. Fermi-level pinning in full metal/high-k/SiO2/Si stacks[J]. JOURNAL OF APPLIED PHYSICS,2017,122. |
| APA | Huang, Anping,Zhang, Xinjiang,Li, Yue,Wang, Mei,&Xiao, Zhisong.(2017).Fermi-level pinning in full metal/high-k/SiO2/Si stacks.JOURNAL OF APPLIED PHYSICS,122. |
| MLA | Huang, Anping,et al."Fermi-level pinning in full metal/high-k/SiO2/Si stacks".JOURNAL OF APPLIED PHYSICS 122(2017). |
| 个性服务 |
| 查看访问统计 |
| 相关权益政策 |
| 暂无数据 |
| 收藏/分享 |
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。
修改评论