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Controllable Vapor Growth of Large-Area Aligned CdS x Se1-x Nanowires for Visible Range Integratable Photodetectors.
Muhammad Shoaib; Xiaoxia Wang; Xuehong Zhang; Qinglin Zhang; Anlian Pan
刊名Nano-micro letters
2018
卷号Vol.10 No.4页码:58
关键词Bandgap engineering CdSxSe1−x nanowires Graphoepitaxial effect Optical waveguide Photodetectors
ISSN号2150-5551
URL标识查看原文
公开日期[db:dc_date_available]
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/5469922
专题湖南大学
作者单位Key Laboratory for Micro-Nano Physics and Technology of Hunan Province, State Key Laboratory of Chemo/Biosensing and Chemometrics, College of Materials Science and Engineering, Hunan University, Changsha, 410082 Hunan People's Republic of China.
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GB/T 7714
Muhammad Shoaib,Xiaoxia Wang,Xuehong Zhang,et al. Controllable Vapor Growth of Large-Area Aligned CdS x Se1-x Nanowires for Visible Range Integratable Photodetectors.[J]. Nano-micro letters,2018,Vol.10 No.4:58.
APA Muhammad Shoaib,Xiaoxia Wang,Xuehong Zhang,Qinglin Zhang,&Anlian Pan.(2018).Controllable Vapor Growth of Large-Area Aligned CdS x Se1-x Nanowires for Visible Range Integratable Photodetectors..Nano-micro letters,Vol.10 No.4,58.
MLA Muhammad Shoaib,et al."Controllable Vapor Growth of Large-Area Aligned CdS x Se1-x Nanowires for Visible Range Integratable Photodetectors.".Nano-micro letters Vol.10 No.4(2018):58.
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