| Overlapping pattern projector | |
| MOR, ZAFRIR; MORGENSTEIN, BORIS | |
| 2018-08-21 | |
| 著作权人 | APPLE INC. |
| 专利号 | US10054430 |
| 国家 | 美国 |
| 文献子类 | 授权发明 |
| 其他题名 | Overlapping pattern projector |
| 英文摘要 | An optoelectronic device includes a semiconductor substrate, an array of optical emitters arranged on the substrate in a two-dimensional pattern, a projection lens and a diffractive optical element (DOE). The projection lens is mounted on the semiconductor substrate and is configured to collect and focus light emitted by the optical emitters so as to project optical beams containing a light pattern corresponding to the two-dimensional pattern of the optical emitters on the substrate. The DOE is mounted on the substrate and is configured to produce and project multiple overlapping replicas of the pattern. |
| 公开日期 | 2018-08-21 |
| 申请日期 | 2016-03-01 |
| 状态 | 授权 |
| 内容类型 | 专利 |
| 源URL | [http://ir.opt.ac.cn/handle/181661/34299]  |
| 专题 | 半导体激光器专利数据库 |
| 作者单位 | APPLE INC. |
| 推荐引用方式 GB/T 7714 | MOR, ZAFRIR,MORGENSTEIN, BORIS. Overlapping pattern projector. US10054430. 2018-08-21. |
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