The effect of N(2) flow rate on discharge characteristics of microwave electron cyclotron resonance plasma | |
Ding, Wan-Yu; Xu, Jun; Lu, Wen-Qi; Deng, Xin-Lu; Dong, Chuang | |
刊名 | PHYSICS OF PLASMAS |
2009 | |
卷号 | 16 |
关键词 | argon cyclotron resonance discharges (electric) gas mixtures nanoindentation nitrogen plasma density plasma deposition silicon compounds thin films |
ISSN号 | 1070-664X |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/5309102 |
专题 | 大连理工大学 |
作者单位 | 1.Dalian Jiaotong Univ, Inst Optoelect Mat & Devices, Dalian 116028, Peoples R China. 2.Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion & Electron, Dalian 116024, Peoples R China. 3.Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion & Electron, Dalian 116024, Peoples R China. |
推荐引用方式 GB/T 7714 | Ding, Wan-Yu,Xu, Jun,Lu, Wen-Qi,et al. The effect of N(2) flow rate on discharge characteristics of microwave electron cyclotron resonance plasma[J]. PHYSICS OF PLASMAS,2009,16. |
APA | Ding, Wan-Yu,Xu, Jun,Lu, Wen-Qi,Deng, Xin-Lu,&Dong, Chuang.(2009).The effect of N(2) flow rate on discharge characteristics of microwave electron cyclotron resonance plasma.PHYSICS OF PLASMAS,16. |
MLA | Ding, Wan-Yu,et al."The effect of N(2) flow rate on discharge characteristics of microwave electron cyclotron resonance plasma".PHYSICS OF PLASMAS 16(2009). |
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