Structure and elastic recovery of Cr–C:H films deposited by a reactive magnetron sputtering technique
Dai W(代伟) ; Wu GS(吴国松) ; Wang AY(汪爱英)
刊名Applied Surface Science
2010
卷号257页码:244-248
关键词Cr–C:H Carbide Microstructure Elastic recovery Tribological behavior
ISSN号0169-4332
通讯作者汪爱英
中文摘要Cr-containing hydrogenated amorphous carbon (Cr–C:H) filmswere deposited on silicon substrates usinga DC reactivemagnetron sputtering with Cr target in an Ar and C2H2 gasmixture. The composition, bondstructure,mechanical hardness and elastic recovery of the filmswere characterized using energy disper-sive X-ray spectroscopy, X-ray photoelectron spectroscopy, Raman spectroscopy and nano-indentation.The film tribological behavior was also studied by a ball-on-disc tribo-tester. The results showed thatthe films deposited at low C2H2 flow rate (<10 sccm) presented a feature of composite Cr–C:H structure,which consisted of hard brittle chromium carbide phases and amorphous hydrocarbon phase, and thusled to the observed lowelastic recovery and poorwear resistance of the films.However, the filmdepositedat high C2H2 flow rate (40 sccm) was found to present a typical feature of polymer-like a-C:H structurecontaining a large amount of sp3 C–H bonds. As a result, the film revealed a high elastic recovery, andthus exhibited an excellent wear resistance.
学科主题材料科学与物理化学
收录类别SCI
资助信息the project of Science and Technology Department of Zhejiang Province (Grant Nos.: 2008C21055, 2009C11SA550048);Ningbo Municipal International Cooperation Foundation (Grant No: 2008B10046)
语种英语
公开日期2012-09-28
内容类型期刊论文
源URL[http://210.77.64.217/handle/362003/953]  
专题兰州化学物理研究所_固体润滑国家重点实验室
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Dai W,Wu GS,Wang AY. Structure and elastic recovery of Cr–C:H films deposited by a reactive magnetron sputtering technique[J]. Applied Surface Science,2010,257:244-248.
APA 代伟,吴国松,&汪爱英.(2010).Structure and elastic recovery of Cr–C:H films deposited by a reactive magnetron sputtering technique.Applied Surface Science,257,244-248.
MLA 代伟,et al."Structure and elastic recovery of Cr–C:H films deposited by a reactive magnetron sputtering technique".Applied Surface Science 257(2010):244-248.
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