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Epitaxial growth of Si/SiC heterostructures with different preferred orientations on 6H-SiC(0001) by LPCVD
Li, L. B.; Chen, Z. M.; Zang, Y.; Song, L. X.; Han, Y. L.; Chu, Q.
2016
卷号18页码:5681-5685
ISSN号1466-8033
DOI10.1039/c6ce00137h
URL标识查看原文
WOS记录号WOS:000381417700011
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/4982290
专题西安理工大学
推荐引用方式
GB/T 7714
Li, L. B.,Chen, Z. M.,Zang, Y.,et al. Epitaxial growth of Si/SiC heterostructures with different preferred orientations on 6H-SiC(0001) by LPCVD[J],2016,18:5681-5685.
APA Li, L. B.,Chen, Z. M.,Zang, Y.,Song, L. X.,Han, Y. L.,&Chu, Q..(2016).Epitaxial growth of Si/SiC heterostructures with different preferred orientations on 6H-SiC(0001) by LPCVD.,18,5681-5685.
MLA Li, L. B.,et al."Epitaxial growth of Si/SiC heterostructures with different preferred orientations on 6H-SiC(0001) by LPCVD".18(2016):5681-5685.
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