Optimization of WEDM process parameters for monocrystalline silicon by response surface method and genetic algorithm | |
Chen, Yu-Long; Li, Shu-Juan; Huang, Hu; Gu, Zhong-Hao | |
2017 | |
会议名称 | 2017 International Conference on Artificial Intelligence, Automation and Control Technologies, AIACT 2017 |
会议日期 | 2017-04-07 |
会议地点 | Wuhan, China |
URL标识 | 查看原文 |
内容类型 | 会议论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/4978856 |
专题 | 西安理工大学 |
推荐引用方式 GB/T 7714 | Chen, Yu-Long,Li, Shu-Juan,Huang, Hu,et al. Optimization of WEDM process parameters for monocrystalline silicon by response surface method and genetic algorithm[C]. 见:2017 International Conference on Artificial Intelligence, Automation and Control Technologies, AIACT 2017. Wuhan, China. 2017-04-07. |
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