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	Band Offset Measurements in Atomic-Layer-Deposited Al2O3/Zn0.8Al0.2O Heterojunction Studied by X-ray Photoelectron Spectroscopy
	Yan, Baojun; Liu, Shulin; Heng, Yuekun; Yang, Yuzhen; Yu, Yang; Wen, Kaile
	2017
卷号	12
关键词	Atomic layer deposition X-ray photoelectron spectroscopy Heterojunction Microchannel plate
ISSN号	1556-276X
DOI	10.1186/s11671-017-2131-8
URL标识	查看原文
WOS记录号	WOS:000401723100006
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4978197
专题	西安理工大学
推荐引用方式 GB/T 7714	Yan, Baojun,Liu, Shulin,Heng, Yuekun,et al. Band Offset Measurements in Atomic-Layer-Deposited Al2O3/Zn0.8Al0.2O Heterojunction Studied by X-ray Photoelectron Spectroscopy[J],2017,12.
APA	Yan, Baojun,Liu, Shulin,Heng, Yuekun,Yang, Yuzhen,Yu, Yang,&Wen, Kaile.(2017).Band Offset Measurements in Atomic-Layer-Deposited Al2O3/Zn0.8Al0.2O Heterojunction Studied by X-ray Photoelectron Spectroscopy.,12.
MLA	Yan, Baojun,et al."Band Offset Measurements in Atomic-Layer-Deposited Al2O3/Zn0.8Al0.2O Heterojunction Studied by X-ray Photoelectron Spectroscopy".12(2017).

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