Microstructure evolution of polycrystalline Ti2AlN MAX phase film during post-deposition annealing | |
Wang, Tao; Chen, Zhe; Wang, Guoqing; Wang, Lei; Zhang, Guojun | |
2018 | |
卷号 | 38页码:4892-4898 |
关键词 | Ti2AlN MAX phase Thin films Thermal stability |
ISSN号 | 0955-2219 |
DOI | 10.1016/j.jeurceramsoc.2018.07.028 |
URL标识 | 查看原文 |
WOS记录号 | WOS:000444664300009 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/4974251 |
专题 | 西安理工大学 |
推荐引用方式 GB/T 7714 | Wang, Tao,Chen, Zhe,Wang, Guoqing,et al. Microstructure evolution of polycrystalline Ti2AlN MAX phase film during post-deposition annealing[J],2018,38:4892-4898. |
APA | Wang, Tao,Chen, Zhe,Wang, Guoqing,Wang, Lei,&Zhang, Guojun.(2018).Microstructure evolution of polycrystalline Ti2AlN MAX phase film during post-deposition annealing.,38,4892-4898. |
MLA | Wang, Tao,et al."Microstructure evolution of polycrystalline Ti2AlN MAX phase film during post-deposition annealing".38(2018):4892-4898. |
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