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	Effect of Processing Parameters on Monolayer MoS2 Prepared by APCVD in a Quasiclosed Crucible
	Yang, Yong; Pu, Hongbin; Li, Lianbi; Di, Junjie; Lin, Tao; Hu, Jichao; Zang, Yuan; Zhang, Shan
	2019
卷号	48页码:4947-4958
关键词	Monolayer MoS2 immunity to process parameters quasiclosed crucible CVD
ISSN号	0361-5235
DOI	10.1007/s11664-019-07297-1
URL标识	查看原文
WOS记录号	WOS:000473507400022
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4968597
专题	西安理工大学
推荐引用方式 GB/T 7714	Yang, Yong,Pu, Hongbin,Li, Lianbi,et al. Effect of Processing Parameters on Monolayer MoS2 Prepared by APCVD in a Quasiclosed Crucible[J],2019,48:4947-4958.
APA	Yang, Yong.,Pu, Hongbin.,Li, Lianbi.,Di, Junjie.,Lin, Tao.,...&Zhang, Shan.(2019).Effect of Processing Parameters on Monolayer MoS2 Prepared by APCVD in a Quasiclosed Crucible.,48,4947-4958.
MLA	Yang, Yong,et al."Effect of Processing Parameters on Monolayer MoS2 Prepared by APCVD in a Quasiclosed Crucible".48(2019):4947-4958.

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