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	Making high-fidelity imprint template by resist patterns over a flexible conductive polymer substrate
	Ye, Xiangdong; Ding, Yucheng; Duan, Yugang; Liu, Hongzhong; Shao, Jinyou
刊名	JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
	2010
卷号	28期号:1页码:86-89
关键词	nanopatterning electron beam lithography resists polymer films
ISSN号	1071-1023
DOI	10.1116/1.3273601
URL标识	查看原文
WOS记录号	WOS:000275511800047
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4810073
专题	西安交通大学
推荐引用方式 GB/T 7714	Ye, Xiangdong,Ding, Yucheng,Duan, Yugang,et al. Making high-fidelity imprint template by resist patterns over a flexible conductive polymer substrate[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,2010,28(1):86-89.
APA	Ye, Xiangdong,Ding, Yucheng,Duan, Yugang,Liu, Hongzhong,&Shao, Jinyou.(2010).Making high-fidelity imprint template by resist patterns over a flexible conductive polymer substrate.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,28(1),86-89.
MLA	Ye, Xiangdong,et al."Making high-fidelity imprint template by resist patterns over a flexible conductive polymer substrate".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 28.1(2010):86-89.

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