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	Multiple-exposure colloidal lithography for enhancing light output of GaN-based light-emitting diodes by patterning Ni/Au electrodes
	Xiong, Zhuo; Wei, Tongbo; Zhang, Yonghui; Wang, Junxi; Li, Jinmin
刊名	OPTICS EXPRESS
	2016
卷号	24期号:2页码:A44-A51
DOI	10.1364/OE.24.000A44
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4760689
专题	山东大学
作者单位	Chinese Acad Sci, Inst Semicond, State Key Lab Solid State Lighting, Beijing 10008
推荐引用方式 GB/T 7714	Xiong, Zhuo,Wei, Tongbo,Zhang, Yonghui,et al. Multiple-exposure colloidal lithography for enhancing light output of GaN-based light-emitting diodes by patterning Ni/Au electrodes[J]. OPTICS EXPRESS,2016,24(2):A44-A51.
APA	Xiong, Zhuo,Wei, Tongbo,Zhang, Yonghui,Wang, Junxi,&Li, Jinmin.(2016).Multiple-exposure colloidal lithography for enhancing light output of GaN-based light-emitting diodes by patterning Ni/Au electrodes.OPTICS EXPRESS,24(2),A44-A51.
MLA	Xiong, Zhuo,et al."Multiple-exposure colloidal lithography for enhancing light output of GaN-based light-emitting diodes by patterning Ni/Au electrodes".OPTICS EXPRESS 24.2(2016):A44-A51.

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