CORC  > 湖南大学
Short channel monolayer MoS2 field-effect transistors defined by SiOx nanofins down to 20nm
Bi, KX; Liu, HZ; Chen, YQ; Luo, F; Shu, ZW; Lin, J; Liu, S; Liu, HW; Zeng, ZY; Dai, P
刊名NANOTECHNOLOGY
2019
卷号Vol.30 No.29
关键词short channel devices hydrogen silsesquioxane (HSQ) electron resists large area preparation
ISSN号0957-4484;1361-6528
URL标识查看原文
公开日期[db:dc_date_available]
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/4748573
专题湖南大学
作者单位1.Hunan Univ, State Key Lab Adv Design & Mfg Vehicle Body, Sch Phys & Elect, Changsha 410082, Hunan, Peoples R China
2.Hunan Univ, Coll Mech & Vehicle Engn, Changsha 410082, Hunan, Peoples R China
3.Natl Univ Def Technol, Coll Adv Interdisciplinary Studies, Changsha 410073, Hunan, Peoples R China
4.Hunan Univ, Coll Chem & Chem Engn, State Key Lab Chemo Biosensing & Chemometr, ICBN, Changsha 410082, Hunan, Peoples R China
推荐引用方式
GB/T 7714
Bi, KX,Liu, HZ,Chen, YQ,et al. Short channel monolayer MoS2 field-effect transistors defined by SiOx nanofins down to 20nm[J]. NANOTECHNOLOGY,2019,Vol.30 No.29.
APA Bi, KX.,Liu, HZ.,Chen, YQ.,Luo, F.,Shu, ZW.,...&Dai, P.(2019).Short channel monolayer MoS2 field-effect transistors defined by SiOx nanofins down to 20nm.NANOTECHNOLOGY,Vol.30 No.29.
MLA Bi, KX,et al."Short channel monolayer MoS2 field-effect transistors defined by SiOx nanofins down to 20nm".NANOTECHNOLOGY Vol.30 No.29(2019).
个性服务
查看访问统计
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。


©版权所有 ©2017 CSpace - Powered by CSpace