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Heteroepitaxial 3C-SiC on Si with flow-modulated carbonization process conditions
Li, Yun; Zhao, Zhifei; Yu, Le; Wang, Yi; Yin, Zhijun; Li, Zhonghui; Han, Ping
刊名JOURNAL OF CRYSTAL GROWTH
2019
卷号Vol.506页码:114-116
关键词Chemical vapor deposition processes Semiconducting materials Heteroepitaxial 3C-SiC films Flow-modulated carbonization process
ISSN号0022-0248
URL标识查看原文
公开日期[db:dc_date_available]
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/4736956
专题湖南大学
作者单位1.Nanjing Univ, Coll Elect Sci & Engn, Nanjing 210093, Jiangsu, Peoples R China
2.Nanjing Elect Devices Inst, Sci & Technol Monolith Integrated Circuits & Modu, Nanjing 210016, Jiangsu, Peoples R China
推荐引用方式
GB/T 7714
Li, Yun,Zhao, Zhifei,Yu, Le,et al. Heteroepitaxial 3C-SiC on Si with flow-modulated carbonization process conditions[J]. JOURNAL OF CRYSTAL GROWTH,2019,Vol.506:114-116.
APA Li, Yun.,Zhao, Zhifei.,Yu, Le.,Wang, Yi.,Yin, Zhijun.,...&Han, Ping.(2019).Heteroepitaxial 3C-SiC on Si with flow-modulated carbonization process conditions.JOURNAL OF CRYSTAL GROWTH,Vol.506,114-116.
MLA Li, Yun,et al."Heteroepitaxial 3C-SiC on Si with flow-modulated carbonization process conditions".JOURNAL OF CRYSTAL GROWTH Vol.506(2019):114-116.
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