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	Manufacturing Graphene‐Encapsulated Copper Particles by Chemical Vapor Deposition in a Cold Wall Reactor
	Shujing Chen; Abdelhafid Zehri; Qianlong Wang; Guangjie Yuan; Xiaohua Liu; Nan Wang; Johan Liu
刊名	ChemistryOpen
	2019
卷号	Vol.8 No.1页码:58-63
关键词	cold wall reactor copper particles graphene oxidation resistance thermal conductivity
URL标识	查看原文
公开日期	[db:dc_date_available]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4602599
专题	湖南大学
作者单位	1.SMIT Center School of Mechatronic Engineering and Automation, Shanghai University, Shanghai, 201800 China 2.Electronics Materials and Systems Laboratory Department of Microtechnology and Nanoscience, Chalmers University of Technology, SE-412 96 Gteborg, Sweden 3.Shenzhen Institute of Advanced Graphene Application and Technology , Shenzhen, 518106 China 4.Shanghai Shang Da Ruihu Microsystem Integration Technology Co. Ltd. Room 203, Building 2, No 1919, Shanghai, 200444 China 5.SHT Smart High Tech AB Hugo Grauers Gatan 3A, SE-411 33 Gteborg, Sweden
推荐引用方式 GB/T 7714	Shujing Chen,Abdelhafid Zehri,Qianlong Wang,et al. Manufacturing Graphene‐Encapsulated Copper Particles by Chemical Vapor Deposition in a Cold Wall Reactor[J]. ChemistryOpen,2019,Vol.8 No.1:58-63.
APA	Shujing Chen.,Abdelhafid Zehri.,Qianlong Wang.,Guangjie Yuan.,Xiaohua Liu.,...&Johan Liu.(2019).Manufacturing Graphene‐Encapsulated Copper Particles by Chemical Vapor Deposition in a Cold Wall Reactor.ChemistryOpen,Vol.8 No.1,58-63.
MLA	Shujing Chen,et al."Manufacturing Graphene‐Encapsulated Copper Particles by Chemical Vapor Deposition in a Cold Wall Reactor".ChemistryOpen Vol.8 No.1(2019):58-63.

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