QQ客服 官方微博 反馈留言

	Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
	Tang Wen-Hui; Liu Bang-Wu; Zhang Bo-Cheng; Li Min; Xia Yang
刊名	ACTA PHYSICA SINICA
	2017
卷号	66期号:9
关键词	plasma-enhanced atomic layer deposition GaN low-temperature deposition
DOI	10.7498/aps.66.098101
URL标识	查看原文
公开日期	[db:dc_date_available]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4585418
专题	山东大学
作者单位	1.Shandong Univ Sci & Technol, Sch Mat Sci & Engn, Qingdao 266000, Peoples R China. 2.Chin
推荐引用方式 GB/T 7714	Tang Wen-Hui,Liu Bang-Wu,Zhang Bo-Cheng,et al. Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition[J]. ACTA PHYSICA SINICA,2017,66(9).
APA	Tang Wen-Hui,Liu Bang-Wu,Zhang Bo-Cheng,Li Min,&Xia Yang.(2017).Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition.ACTA PHYSICA SINICA,66(9).
MLA	Tang Wen-Hui,et al."Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition".ACTA PHYSICA SINICA 66.9(2017).

个性服务

查看访问统计

相关权益政策

暂无数据

收藏/分享

除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。