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	Tuning Effect of N-2 on Atmospheric-Pressure Cold Plasma CVD of TiO2 Photocatalytic Films
	Lanbo, Di; Xiaosong, Li; Tianliang, Zhao; Dalei, Chang; Qianqian, Liu; Aimin, Zhu; Di, Lanbo; Li, Xiaosong; Zhao, Tianliang; Chang, Dalei
刊名	PLASMA SCIENCE & TECHNOLOGY
	2013
卷号	15页码:64-69
关键词	plasma CVD TiO2 photocatalytic films atmospheric-pressure cold plasma dielectric barrier discharge (DBD) optical emission spectra (OES)
ISSN号	1009-0630
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4537575
专题	大连理工大学
作者单位	Laboratory of Plasma Physical Chemistry, School of Physics and Optoelectronic Engineering, Dalian University of Technology, Dalian 116024, China
推荐引用方式 GB/T 7714	Lanbo, Di,Xiaosong, Li,Tianliang, Zhao,et al. Tuning Effect of N-2 on Atmospheric-Pressure Cold Plasma CVD of TiO2 Photocatalytic Films[J]. PLASMA SCIENCE & TECHNOLOGY,2013,15:64-69.
APA	Lanbo, Di.,Xiaosong, Li.,Tianliang, Zhao.,Dalei, Chang.,Qianqian, Liu.,...&Zhu, Aimin.(2013).Tuning Effect of N-2 on Atmospheric-Pressure Cold Plasma CVD of TiO2 Photocatalytic Films.PLASMA SCIENCE & TECHNOLOGY,15,64-69.
MLA	Lanbo, Di,et al."Tuning Effect of N-2 on Atmospheric-Pressure Cold Plasma CVD of TiO2 Photocatalytic Films".PLASMA SCIENCE & TECHNOLOGY 15(2013):64-69.

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