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	Role of rapid and slow cooling on leakage mechanism and ferroelectric polarization of sputtered epitaxial BiFeO3 thin films
	Zhu, Hanfei; Ma, Hongfang; Zhao, Yuyao
刊名	VACUUM
	2019
卷号	163页码:312-316
关键词	BiFeO3 thin films Leakage current Ferroelectric polarization Cooling environment Sputtering
DOI	10.1016/j.vacuum.2019.02.040
URL标识	查看原文
公开日期	[db:dc_date_available]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4535096
专题	山东大学
作者单位	Qilu Univ Technol, Inst Adv Energy Mat & Chem, Sch Chem & Pharmaceut Engn, Shandong Acad Sci, Jinan 250353, Shandong, Peoples R China.
推荐引用方式 GB/T 7714	Zhu, Hanfei,Ma, Hongfang,Zhao, Yuyao. Role of rapid and slow cooling on leakage mechanism and ferroelectric polarization of sputtered epitaxial BiFeO3 thin films[J]. VACUUM,2019,163:312-316.
APA	Zhu, Hanfei,Ma, Hongfang,&Zhao, Yuyao.(2019).Role of rapid and slow cooling on leakage mechanism and ferroelectric polarization of sputtered epitaxial BiFeO3 thin films.VACUUM,163,312-316.
MLA	Zhu, Hanfei,et al."Role of rapid and slow cooling on leakage mechanism and ferroelectric polarization of sputtered epitaxial BiFeO3 thin films".VACUUM 163(2019):312-316.

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