Polarity dependent structure and optical properties of freestanding GaN layers grown by hydride vapor phase epitaxy | |
Hu, Qiang ; Wei, Tongbo ; Duan, Ruifei ; Yang, Jiankun ; Huo, Ziqiang ; Zeng, Yiping ; Xu, Shu | |
刊名 | materials science in semiconductor processing |
2011 | |
关键词 | Carrier concentration Etching Gallium alloys Optical properties Point defects Raman spectroscopy Semiconducting gallium compounds Vapor phase epitaxy Vapors |
ISSN号 | 13698001 |
通讯作者 | hu, q.(huqiang@semi.ac.cn) |
学科主题 | 半导体材料 |
收录类别 | EI |
语种 | 英语 |
公开日期 | 2012-06-14 |
内容类型 | 期刊论文 |
源URL | [http://ir.semi.ac.cn/handle/172111/23146] |
专题 | 半导体研究所_中科院半导体照明研发中心 |
推荐引用方式 GB/T 7714 | Hu, Qiang,Wei, Tongbo,Duan, Ruifei,et al. Polarity dependent structure and optical properties of freestanding GaN layers grown by hydride vapor phase epitaxy[J]. materials science in semiconductor processing,2011. |
APA | Hu, Qiang.,Wei, Tongbo.,Duan, Ruifei.,Yang, Jiankun.,Huo, Ziqiang.,...&Xu, Shu.(2011).Polarity dependent structure and optical properties of freestanding GaN layers grown by hydride vapor phase epitaxy.materials science in semiconductor processing. |
MLA | Hu, Qiang,et al."Polarity dependent structure and optical properties of freestanding GaN layers grown by hydride vapor phase epitaxy".materials science in semiconductor processing (2011). |
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