Polarity dependent structure and optical properties of freestanding GaN layers grown by hydride vapor phase epitaxy
Hu, Qiang ; Wei, Tongbo ; Duan, Ruifei ; Yang, Jiankun ; Huo, Ziqiang ; Zeng, Yiping ; Xu, Shu
刊名materials science in semiconductor processing
2011
关键词Carrier concentration Etching Gallium alloys Optical properties Point defects Raman spectroscopy Semiconducting gallium compounds Vapor phase epitaxy Vapors
ISSN号13698001
通讯作者hu, q.(huqiang@semi.ac.cn)
学科主题半导体材料
收录类别EI
语种英语
公开日期2012-06-14
内容类型期刊论文
源URL[http://ir.semi.ac.cn/handle/172111/23146]  
专题半导体研究所_中科院半导体照明研发中心
推荐引用方式
GB/T 7714
Hu, Qiang,Wei, Tongbo,Duan, Ruifei,et al. Polarity dependent structure and optical properties of freestanding GaN layers grown by hydride vapor phase epitaxy[J]. materials science in semiconductor processing,2011.
APA Hu, Qiang.,Wei, Tongbo.,Duan, Ruifei.,Yang, Jiankun.,Huo, Ziqiang.,...&Xu, Shu.(2011).Polarity dependent structure and optical properties of freestanding GaN layers grown by hydride vapor phase epitaxy.materials science in semiconductor processing.
MLA Hu, Qiang,et al."Polarity dependent structure and optical properties of freestanding GaN layers grown by hydride vapor phase epitaxy".materials science in semiconductor processing (2011).
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