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	Reverse Nonequilibrium Molecular Dynamics Calculation of the Resist Shear Viscosity in UV-Nanoimprint Lithography
	Du, Jun; Wei, Zhengying; Tang, Yiping
刊名	JOURNAL OF COMPUTATIONAL AND THEORETICAL NANOSCIENCE
	2013
卷号	10期号:[db:dc_citation_issue]页码:208-212
关键词	Shear Viscosity Nonequilibrium Molecular Dynamics Photo-Curable Resist
ISSN号	1546-1955
DOI	[db:dc_identifier_doi]
URL标识	查看原文
WOS记录号	[DB:DC_IDENTIFIER_WOSID]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4436836
专题	西安交通大学
推荐引用方式 GB/T 7714	Du, Jun,Wei, Zhengying,Tang, Yiping. Reverse Nonequilibrium Molecular Dynamics Calculation of the Resist Shear Viscosity in UV-Nanoimprint Lithography[J]. JOURNAL OF COMPUTATIONAL AND THEORETICAL NANOSCIENCE,2013,10([db:dc_citation_issue]):208-212.
APA	Du, Jun,Wei, Zhengying,&Tang, Yiping.(2013).Reverse Nonequilibrium Molecular Dynamics Calculation of the Resist Shear Viscosity in UV-Nanoimprint Lithography.JOURNAL OF COMPUTATIONAL AND THEORETICAL NANOSCIENCE,10([db:dc_citation_issue]),208-212.
MLA	Du, Jun,et al."Reverse Nonequilibrium Molecular Dynamics Calculation of the Resist Shear Viscosity in UV-Nanoimprint Lithography".JOURNAL OF COMPUTATIONAL AND THEORETICAL NANOSCIENCE 10.[db:dc_citation_issue](2013):208-212.

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