Method for reducing high-energy plasma ion bombardment substrate material to etch, involves determining frequency range of pulse signal for about specific in range, and determining duty ratio of pulse signal for about specific in range. | |
GAO F LIU W WANG Y | |
2015 | |
公开日期 | 2015-11-18 |
URL标识 | 查看原文 |
申请日期 | 2015-07-15 |
内容类型 | 专利 |
URI标识 | http://www.corc.org.cn/handle/1471x/4413276 |
专题 | 大连理工大学 |
作者单位 | UNIV DALIAN TECHNOLOGY (UYDA-C |
推荐引用方式 GB/T 7714 | GAO F LIU W WANG Y. Method for reducing high-energy plasma ion bombardment substrate material to etch, involves determining frequency range of pulse signal for about specific in range, and determining duty ratio of pulse signal for about specific in range.. 2015-01-01. |
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