| Residual stress and thermal stability of AlN thin films deposited by reactive laser ablation | |
| Wang, Honghai; Zheng, Qiguang; Qiu, Junlin; Xiong, Guiguang; Tian, Decheng | |
| 刊名 | 中国激光
 |
| 2000 | |
| 卷号 | 27期号:9 |
| ISSN号 | 0258-7025 |
| URL标识 | 查看原文 |
| 收录类别 | EI |
| 语种 | 中文 |
| 内容类型 | 期刊论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/4220333 |
| 专题 | 武汉大学 |
| 推荐引用方式 GB/T 7714 | Wang, Honghai,Zheng, Qiguang,Qiu, Junlin,et al. Residual stress and thermal stability of AlN thin films deposited by reactive laser ablation[J]. 中国激光,2000,27(9). |
| APA | Wang, Honghai,Zheng, Qiguang,Qiu, Junlin,Xiong, Guiguang,&Tian, Decheng.(2000).Residual stress and thermal stability of AlN thin films deposited by reactive laser ablation.中国激光,27(9). |
| MLA | Wang, Honghai,et al."Residual stress and thermal stability of AlN thin films deposited by reactive laser ablation".中国激光 27.9(2000). |
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