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Development of pore interconnectivity/morphology in porous silica films investigated by cyclic voltammetry and slow positron annihilation spectroscopy
Tang, Xiuqin; Xiong, Bangyun; Li, Qichao; Mao, Wenfeng; Xiao, Wei; Fang, Pengfei; He, Chunqing
刊名ELECTROCHIMICA ACTA
2015
卷号168
关键词Cyclic voltammetry Porous films Positron annihilation Pore interconnectivity/morphology
ISSN号0013-4686
DOI10.1016/j.electacta.2015.03.225
URL标识查看原文
收录类别SCIE ; EI
语种英语
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/4107266
专题武汉大学
推荐引用方式
GB/T 7714
Tang, Xiuqin,Xiong, Bangyun,Li, Qichao,et al. Development of pore interconnectivity/morphology in porous silica films investigated by cyclic voltammetry and slow positron annihilation spectroscopy[J]. ELECTROCHIMICA ACTA,2015,168.
APA Tang, Xiuqin.,Xiong, Bangyun.,Li, Qichao.,Mao, Wenfeng.,Xiao, Wei.,...&He, Chunqing.(2015).Development of pore interconnectivity/morphology in porous silica films investigated by cyclic voltammetry and slow positron annihilation spectroscopy.ELECTROCHIMICA ACTA,168.
MLA Tang, Xiuqin,et al."Development of pore interconnectivity/morphology in porous silica films investigated by cyclic voltammetry and slow positron annihilation spectroscopy".ELECTROCHIMICA ACTA 168(2015).
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