| A General Method for Large-Scale Fabrication of Semiconducting Oxides with High SERS Sensitivity | |
| Zheng, Xudong; Ren, Feng; Zhang, Shunping; Zhang, Xiaolei; Wu, Hengyi; Zhang, Xingang; Xing, Zhuo; Qin, Wenjing; Liu, Yong; Jiang, Changzhong | |
| 刊名 | ACS APPLIED MATERIALS & INTERFACES
 |
| 2017 | |
| 卷号 | 9期号:16 |
| 关键词 | ion irradiation semiconducting oxide oxygen vacancy charge transfer surface-enhanced Raman scattering |
| ISSN号 | 1944-8244 |
| DOI | 10.1021/acsami.7b03839 |
| URL标识 | 查看原文 |
| 收录类别 | SCIE ; EI |
| 语种 | 英语 |
| 内容类型 | 期刊论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/4104250 |
| 专题 | 武汉大学 |
| 推荐引用方式 GB/T 7714 | Zheng, Xudong,Ren, Feng,Zhang, Shunping,et al. A General Method for Large-Scale Fabrication of Semiconducting Oxides with High SERS Sensitivity[J]. ACS APPLIED MATERIALS & INTERFACES,2017,9(16). |
| APA | Zheng, Xudong.,Ren, Feng.,Zhang, Shunping.,Zhang, Xiaolei.,Wu, Hengyi.,...&Jiang, Changzhong.(2017).A General Method for Large-Scale Fabrication of Semiconducting Oxides with High SERS Sensitivity.ACS APPLIED MATERIALS & INTERFACES,9(16). |
| MLA | Zheng, Xudong,et al."A General Method for Large-Scale Fabrication of Semiconducting Oxides with High SERS Sensitivity".ACS APPLIED MATERIALS & INTERFACES 9.16(2017). |
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