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	Annealing temperature effects on ferromagnetism and structure of Si1-xMnx films prepared by magnetron sputtering
	Li, Tiecheng; Guo, Liping; Liu, Congxiao; Peng, Cuoliang; He, Bo; Pan, Zhiyun; Zhou, Zhongpo; Xu, Shuigang; Quan, Zuci
刊名	VACUUM
	2012
卷号	86期号:9
关键词	Magnetron sputtering Diluted magnetic semiconductors X-ray absorption near-edge structure Post-rapid thermal annealing
ISSN号	0042-207X
DOI	10.1016/j.vacuum.2012.01.001
URL标识	查看原文
收录类别	SCIE ; EI
语种	英语
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4095582
专题	武汉大学
推荐引用方式 GB/T 7714	Li, Tiecheng,Guo, Liping,Liu, Congxiao,et al. Annealing temperature effects on ferromagnetism and structure of Si1-xMnx films prepared by magnetron sputtering[J]. VACUUM,2012,86(9).
APA	Li, Tiecheng.,Guo, Liping.,Liu, Congxiao.,Peng, Cuoliang.,He, Bo.,...&Quan, Zuci.(2012).Annealing temperature effects on ferromagnetism and structure of Si1-xMnx films prepared by magnetron sputtering.VACUUM,86(9).
MLA	Li, Tiecheng,et al."Annealing temperature effects on ferromagnetism and structure of Si1-xMnx films prepared by magnetron sputtering".VACUUM 86.9(2012).

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