Tuning the electron injection barrier between Co and C(60) using Alq(3) buffer layer

	Tuning the electron injection barrier between Co and C(60) using Alq(3) buffer layer
	Wang, YZ ; Qi, DC ; Chen, S ; Mao, HY ; Wee, ATS ; Gao, XY
刊名	JOURNAL OF APPLIED PHYSICS
	2010
卷号	108 期号:10 页码:5
ISSN号	0021-8979
通讯作者	Wee, ATS (reprint author), Natl Univ Singapore, Dept Phys, 2 Sci Dr 3, Singapore 117542, Singapore
学科主题	Physics
收录类别	SCI
语种	英语
公开日期	2012-04-11
内容类型	期刊论文
源URL	[http://ir.sinap.ac.cn/handle/331007/7107]
专题	上海应用物理研究所_中科院上海应用物理研究所2004-2010年
推荐引用方式 GB/T 7714	Wang, YZ,Qi, DC,Chen, S,et al. Tuning the electron injection barrier between Co and C(60) using Alq(3) buffer layer[J]. JOURNAL OF APPLIED PHYSICS,2010,108(10):5.
APA	Wang, YZ,Qi, DC,Chen, S,Mao, HY,Wee, ATS,&Gao, XY.(2010).Tuning the electron injection barrier between Co and C(60) using Alq(3) buffer layer.JOURNAL OF APPLIED PHYSICS,108(10),5.
MLA	Wang, YZ,et al."Tuning the electron injection barrier between Co and C(60) using Alq(3) buffer layer".JOURNAL OF APPLIED PHYSICS 108.10(2010):5.