Phase Change Line Memory Cell Based on Ge2Sb2Te5 Fabricated Using Focused Ion Beam
Du,XF ; Zhang,T ; Song,ZT ; Liu,WL ; Liu,XY ; Gu,YF ; Lv,SL ; Xue,WJ ; Xi,W
刊名JAPANESE JOURNAL OF APPLIED PHYSICS
2011
卷号50期号:7页码:70211
关键词JAPAN SOC APPLIED PHYSICS
ISSN号0021-4922
学科主题Physics ; Applied
公开日期2012-04-10
内容类型期刊论文
源URL[http://ir.sim.ac.cn/handle/331004/106757]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
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GB/T 7714
Du,XF,Zhang,T,Song,ZT,et al. Phase Change Line Memory Cell Based on Ge2Sb2Te5 Fabricated Using Focused Ion Beam[J]. JAPANESE JOURNAL OF APPLIED PHYSICS,2011,50(7):70211.
APA Du,XF.,Zhang,T.,Song,ZT.,Liu,WL.,Liu,XY.,...&Xi,W.(2011).Phase Change Line Memory Cell Based on Ge2Sb2Te5 Fabricated Using Focused Ion Beam.JAPANESE JOURNAL OF APPLIED PHYSICS,50(7),70211.
MLA Du,XF,et al."Phase Change Line Memory Cell Based on Ge2Sb2Te5 Fabricated Using Focused Ion Beam".JAPANESE JOURNAL OF APPLIED PHYSICS 50.7(2011):70211.
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