Scattering loss in silicon-on-insulator rib waveguides fabricated by inductively coupled plasma reactive ion etching

	Scattering loss in silicon-on-insulator rib waveguides fabricated by inductively coupled plasma reactive ion etching
	Wang, YJ ; Lin, ZL ; Cheng, XL ; Zhang, CS ; Gao, F ; Zhang, F
刊名	APPLIED PHYSICS LETTERS
	2004
卷号	85 期号:18 页码:3995-3997
关键词	OPTICAL-FIBERS ROUGHNESS ALIGNMENT
ISSN号	0003-6951
通讯作者	Wang, YJ, Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Ion Beam Lab, 865 Changning Rd, Shanghai 200050, Peoples R China
学科主题	Physics, Applied
收录类别	SCI
语种	英语
公开日期	2012-03-24
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/95460]
专题	上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式 GB/T 7714	Wang, YJ,Lin, ZL,Cheng, XL,et al. Scattering loss in silicon-on-insulator rib waveguides fabricated by inductively coupled plasma reactive ion etching[J]. APPLIED PHYSICS LETTERS,2004,85(18):3995-3997.
APA	Wang, YJ,Lin, ZL,Cheng, XL,Zhang, CS,Gao, F,&Zhang, F.(2004).Scattering loss in silicon-on-insulator rib waveguides fabricated by inductively coupled plasma reactive ion etching.APPLIED PHYSICS LETTERS,85(18),3995-3997.
MLA	Wang, YJ,et al."Scattering loss in silicon-on-insulator rib waveguides fabricated by inductively coupled plasma reactive ion etching".APPLIED PHYSICS LETTERS 85.18(2004):3995-3997.