Relaxed SiGe-on-insulator fabricated by dry oxidation of sandwiched Si/SiGe/Si structure
Di, ZF ; Zhang, M ; Liu, WL ; Zhu, M ; Lin, CL ; Chu, PK
刊名MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
2005
卷号124页码:153-157
关键词ELECTRON-MOBILITY ENHANCEMENT FIELD-EFFECT TRANSISTORS STRAINED-SI LAYER TRANSFER N-MOSFETS GERMANIUM STABILITY SUBSTRATE EPITAXY ALLOYS
ISSN号0921-5107
通讯作者Chu, PK, City Univ Hong Kong, Dept Phys & Mat Sci, Tat Chee Ave, Kowloon, Hong Kong, Peoples R China
学科主题Materials Science, Multidisciplinary; Physics, Condensed Matter
收录类别SCI
语种英语
公开日期2012-03-24
内容类型期刊论文
源URL[http://ir.sim.ac.cn/handle/331004/95341]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Di, ZF,Zhang, M,Liu, WL,et al. Relaxed SiGe-on-insulator fabricated by dry oxidation of sandwiched Si/SiGe/Si structure[J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY,2005,124:153-157.
APA Di, ZF,Zhang, M,Liu, WL,Zhu, M,Lin, CL,&Chu, PK.(2005).Relaxed SiGe-on-insulator fabricated by dry oxidation of sandwiched Si/SiGe/Si structure.MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY,124,153-157.
MLA Di, ZF,et al."Relaxed SiGe-on-insulator fabricated by dry oxidation of sandwiched Si/SiGe/Si structure".MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY 124(2005):153-157.
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