DEPOSITION AND MODIFICATION OF TITANIUM NITRIDE BY ION-ASSISTED ARE DEPOSITION

	DEPOSITION AND MODIFICATION OF TITANIUM NITRIDE BY ION-ASSISTED ARE DEPOSITION
	BENDAVID, A ; MARTIN, PJ ; WANG, X ; WITTLING, M ; KINDER, TJ
刊名	JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
	1995
卷号	13 期号:3 页码:1658-1664
关键词	FILTERED ARC EVAPORATION THIN-FILMS ELASTIC-CONSTANTS BOMBARDMENT TIN COATINGS GROWTH STRESS MICROSTRUCTURE ORIENTATION
ISSN号	0734-2101
通讯作者	BENDAVID, A, CSIRO,DIV APPL PHYS,LINDFIELD,NSW 2070,AUSTRALIA
学科主题	Materials Science, Coatings & Films; Physics, Applied
收录类别	SCI
语种	英语
公开日期	2012-03-25
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/98582]
专题	上海微系统与信息技术研究所_功能材料与器件_期刊论文（1999年以前)
推荐引用方式 GB/T 7714	BENDAVID, A,MARTIN, PJ,WANG, X,et al. DEPOSITION AND MODIFICATION OF TITANIUM NITRIDE BY ION-ASSISTED ARE DEPOSITION[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,1995,13(3):1658-1664.
APA	BENDAVID, A,MARTIN, PJ,WANG, X,WITTLING, M,&KINDER, TJ.(1995).DEPOSITION AND MODIFICATION OF TITANIUM NITRIDE BY ION-ASSISTED ARE DEPOSITION.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,13(3),1658-1664.
MLA	BENDAVID, A,et al."DEPOSITION AND MODIFICATION OF TITANIUM NITRIDE BY ION-ASSISTED ARE DEPOSITION".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS 13.3(1995):1658-1664.