Particle size and surfactant effects on chemical mechanical polishing of glass using silica-based slurry | |
Zhang, ZF ; Liu, WL ; Song, ZT | |
刊名 | APPLIED OPTICS |
2010 | |
卷号 | 49期号:28页码:5480-5485 |
关键词 | SUBSTRATE CMP DIOXIDE PLANARIZATION SAPPHIRE CERIA ACID |
ISSN号 | 0003-6935 |
通讯作者 | Zhang, ZF, Chinese Acad Sci, State Key Lab Funct Mat Informat, Lab Nanotechnol, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China |
学科主题 | Optics |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2012-03-24 |
内容类型 | 期刊论文 |
源URL | [http://ir.sim.ac.cn/handle/331004/94747] |
专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
推荐引用方式 GB/T 7714 | Zhang, ZF,Liu, WL,Song, ZT. Particle size and surfactant effects on chemical mechanical polishing of glass using silica-based slurry[J]. APPLIED OPTICS,2010,49(28):5480-5485. |
APA | Zhang, ZF,Liu, WL,&Song, ZT.(2010).Particle size and surfactant effects on chemical mechanical polishing of glass using silica-based slurry.APPLIED OPTICS,49(28),5480-5485. |
MLA | Zhang, ZF,et al."Particle size and surfactant effects on chemical mechanical polishing of glass using silica-based slurry".APPLIED OPTICS 49.28(2010):5480-5485. |
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